• 师生来信
团队队伍

副教授、副研究员

梁水保

日期:2023-11-22 来源: 作者:

                                

教师简介:

 姓 名:

梁水保

 职 称:

副教授

 所属系:

材料成型及控制工程系

 邮 箱:

s.liang@hfut.edu.cn

 主 页:

http://faculty.hfut.edu.cn/shuibao_liang

个人简历:

梁水保,男,工学博士,williamhill官网副教授、硕士生导师、黄山学者学术骨干。20196月在华南理工大学获工学博士学位,后于英国拉夫堡大学电子制造研究团队从事博士后研究工作,20231月作为高层次人才引进加入英国威廉希尔公司,目前主要从事集成电路和电力电子中电子制造和电子封装互连结构在多物理场下微结构特征及其可靠性影响的相关工作,迄今已参与了多项国家自然科学基金及英国工程与自然科学基金(EPSRC)项目,在微电子可靠性、应用物理、加工制造等领域共计发表学术论文50余篇,多次获邀参加领域内电子元器件及封装可靠性类国际会议(ECTCESTCICEPTESREF)和报道研究成果,曾获最佳论文奖和杰出论文奖,获邀担任半导体与电子技术国际研讨会(ISSET)技术委员会会员,更多相关信息及更新可参见:http://faculty.hfut.edu.cn/shuibao_liang

 

l   教育简历

2013 – 2019,华南理工大学,材料加工工程(微电子封装及可靠性方向),博士

2017 – 2018,英国拉夫堡大学,电子制造与电子封装,联合培养博士

 

 

l  工作简历

2023/1 – 至今, 英国威廉希尔公司,williamhill,副教授

2019 – 2022, 英国拉夫堡大学,机械电气和制造工程学院,博士后

 

 

主讲课程:

 

 

主要科研领域、方向:

 

l  科学研究

主要研究兴趣:半导体元器件封装集成与可靠性工程。具体方向包括:(1) 先进封装及功率器件中界面微结构演化行为与服役可靠性评价;(2) 电力电子器件封装热-力可靠性研究;(3) 电子封装互连结构物理失效分析;(4) 微电子制造过程模拟仿真计算。

 

主持或参与的项目:

 

 

l      科研项目

[1] 英国威廉希尔公司“黄山学者学术骨干”人才引进启动基金,2023/01-2028/01,主持

[2] 英国工程与自然科学基金(EPSRC)项目, 准环境下第三代半导体器件封装无铅耐高温连接技术研发,EP/R032203/12018.07-2023.04,参与

[3] 英国工程与自然科学基金(EPSRC)项目,电力电子中的异构集成技术研发,EP/R004501/12017.11-2022.04,参与

[4] 英国工程与自然科学基金(EPSRC)项目,物联网重设工程设计,EP/V007335/12021.05-2026.04,参与

[5] 国家自然科学基金面上项目,电--力耦合场下TSV铜柱胀缩行为与微凸点焊点的交互作用及对互连可靠性的影响, 51775195,     2018.01-2021.12,参与

[6] 国家自然科学基金青年基金项目, 三维互连微凸点焊点早期界面反应与凝固行为及IMC生长的界面耦合效应, 514051622015.01-2017.12,参与

          [7] 国家自然科学基金面上项目, BGA结构无铅微焊点在电--力多场作用下迁移和失效行为及其尺寸效应, 512751782013.01-2016.12,参与

 

 

研究成果:

l  学术论文

[1] S.  Liang, H. Jiang, Z. Zhong, S. Ramachandran, Insights Into the Grain   Orientation Effect on Electromigration-Induced Failure in Solder  Interconnects Through Phase Field Modeling, IEEE Trans. Electron Devices (2023) DOI: 10.1109/TED.2023.3309280.

[2] S.   Liang, C. Liu, H. Jiang, Z. Zhong, Investigation of Electric-thermal-mechanical  Effects in Electric Assisted Silver Sintering Process through Phase Field  Modelling, IEEE Trans. Compon. Packag. Manuf. Technol. 99 (2023).

[3] S.   Liang, C. Wei, A. Kunwar, U. Subedi, H. Jiang, H. Ma, C. Ke, Phase field    modelling combined with data-driven approach to unravel the orientation   influenced growth of interfacial Cu6Sn5  intermetallics under electric current stressing, Surf. Interfaces (2023) 102728.

[4] S.  Liang, X.P. Zhang, Unraveling the electric field effect on the grain‐boundary   migration in alumina through phase field modeling, J. Am. Ceram. Soc. 106   (2023) 1647-1652.

[5] S.  Liang, M.B. Zhou, C. Ke, C. Wei, X.P. Zhang, Study of migration and    coalescence of voids driven by electric current stressing in solder   interconnects using phase field simulation, Microelectron. Reliab. 138    (2022) 114611.

[6] S.  Liang, Y. Zhong, S. Robertson, A. Liu, H. Jiang, C. Liu, Z. Zhou, C. Liu,   Investigation of thermal effect on solidification in Sn/Cu interconnects   during self-propagating exothermic reaction bonding, Microelectron. Reliab. 138 (2022) 114654.

[7] S. Liang, C. Wei, C. Ke, S. Cao, M.B. Zhou, X.P. Zhang, Investigation of the    Interaction Effect Between the Microstructure Evolution and the  Thermo-Mechanical Behavior of Cu-Filled Through Silicon Via, IEEE Trans.  Device Mater. Reliab. 22 (2022) 267-275.

[8] S. Liang, C. Liu, Z. Zhou, Phase field study of grain boundary migration and  preferential growth in non-magnetic materials under magnetic field, Mater. Today Commun. 31 (2022) 103408.

[9] S. Liang, A. Kunwar, C. Liu, H. Jiang, Z. Zhou, Preferential growth of   intermetallics under temperature gradient at Cu–Sn interface during   transient liquid phase bonding: insights from phase field simulation, J.  Mater. Res. Technol. 19 (2022) 345-353.

[10] S.   Liang, Y. Zhong, S. Robertson, A. Liu, Z. Zhou, C. Liu, Thermo-mechanical   characteristics and reliability of die-attach through self-propagating   exothermic reaction bonding, IEEE Trans. Compon. Packag. Manuf. Technol.  11 (2021) 2122-2129.

[11] S.  Liang, A. Kunwar, C. Wei, C. Ke, Insight into the preferential grain   growth of intermetallics under electric current stressing–A phase field   modeling, Scr. Mater. 203 (2021) 114071.

[12] S.   Liang, C. Ke, C. Wei, J.Q. Huang, M.B. Zhou, X.P. Zhang, Microstructural   evolution and change in macroscopic physical properties of microscale   flip chip Cu/Sn58Bi/Cu joints under the coupling effect of electric  current stressing and elastic stress, J. Mater. Res. 34 (2019) 2775-2788.

[13] S.  Liang, C. Ke, C. Wei, M.B. Zhou, X.P. Zhang, Phase field modeling of   grain boundary migration and preferential grain growth driven by electric    current stressing, J. Appl. Phys. 124 (2018) 175109.

[14] S.   Liang, C. Ke, W. Ma, M.-B. Zhou, X.P. Zhang, Numerical simulations of   migration and coalescence behavior of microvoids driven by diffusion and   electric field in solder interconnects, Microelectron. Reliab. 71 (2017)   71-81.

 

 

 

l  会议报告

[1] 梁水保,       3D封装微凸点焊点界面IMC在物理场下优先生长的机制研究, 2023 电子封装材料与测试技术创新大会, 贵阳, 中国, 1020-22, 2023, 邀请报告.

[2] S.       Liang, Y. Zhong, S. Robertson, A. Liu, Z. Zhou, C. Liu, Investigation of       thermo-mechanical and phase-change behavior in the Sn/Cu interconnects       during self-propagating exothermic reaction bonding, The 70th Electronic       Components and Technology Conference (ECTC), IEEE, Orlando, FL, USA, May.       30-Jun. 3, 2020, pp. 269-275.

[3] S.       Liang, C.Ke, W.J. Ma, M.B. Zhou, X.P. Zhang, Phase field simulation of       Kirkendall voids at the interface of microscale Sn/Cu system lead-free       interconnects, The 15th International Conference on Electronic Packaging       Technology, IEEE, Chengdu, Aug. 12-15, 2014, pp. 641-645.

[4] S.       Liang, C. Ke, W.J. Ma, M.B. Zhou, X.P. Zhang, Phase field simulation of       segregation of the Bi-riched phase in Cu/Sn-Bi/Cu solder interconnects       under electric current stressing,  The 66th Electronic Components       and Technology Conference (ECTC), IEEE, Las Vegas, NV, USA, May. 31-Jun.       3, 2016, pp. 264-270.

[5] S.       Liang, C. Ke, M.Y. Tan, M.B. Zhou, X.P. Zhang, Phase field simulation of       the microstructural evolution and electromigration-induced phase       segregation in line-type Cu/Sn-Bi/Cu solder interconnects, The 17th       International Conference on Electronic Packaging Technology (ICEPT),       IEEE, Wuhan, Aug. 16-19, 2016, pp. 836-840.

[6] S.       Liang, X.P. Zhang, C. Wei, C. Ke, C. Liu, Interaction effects between the       preferred growth of β-Sn grains and thermo-mechanical response in       microbump interconnects under thermal cycling, The 7th Electronic       System-Integration Technology Conference (ESTC), IEEE, Dresden, Germany,       Sep. 18-21, 2018, pp. 1-7.

 

 

 

 

 

l  科研获奖

[1] 2016年,第17届电子封装技术国际会议最佳员工论文奖 (Cisco & ASE Best Student Paper Award),国际电气电子工程师联合会电子元件封装和生产技术学会(IEEE-CPMT)、中国电子学会

[2] 2014年,第15届电子封装技术国际会议杰出论文奖       (JCAP Outstanding Paper Award),国际电气电子工程师联合会电子元件封装和生产技术学会(IEEE-CPMT)、中国电子学会

 

 

 

 

 

上一条:马自力

下一条:沈王强

关闭